Adjusting Polishing Quality Parameters
This module identifies swirls, whirls, and holograms in paint surfaces by analyzing an image of a reflected high-intensity spot positioned at 10 degrees. The algorithm selects visible linear defects based on their contrast against the background luminosity.
1. Sensitivity
Purpose: Controls the threshold for detecting linear defects based on their visibility (contrast against the background).
Options: Lowest, Low, Moderate, High, Highest
How It Works:
Higher sensitivity detects more subtle defects but may include false positives.
Lower sensitivity focuses on more prominent defects, potentially missing subtle ones.
Adjustment Steps:
Start with "Lowest" sensitivity.
If important defects are missed, increase the sensitivity.
2. Minimum Length
Purpose: Sets the smallest size of defects to be included in the analysis, measured in microns.
How It Works:
Larger values exclude smaller defects, focusing on more significant imperfections.
Smaller values include finer defects but may increase detection of irrelevant marks.
Adjustment Steps:
Begin with a moderate value based on your quality standards (Default is 100 microns).
Decrease the value if you need to detect shorter defects.
Increase the value to focus only on larger imperfections.
Adjust based on the typical size of defects relevant to your product quality criteria.
3. Mask Radius
Purpose: Excludes the direct reflection of the high-intensity spot from the analysis.
The default radius removes the spot reflection in smooth mirror like surface.
Increase the radius if surface haze or polishing marks are increasing the reflected spot size and interfering with defect detection.